CERTeM R&D platform
CERTeM R&D platform is a 400m2 class 100 clean room that contains all the equipment needed to manufacture components from small samples up to 8' wafers.
PHOTOLITHOGRAPHY
Photosensitive resin coating
- Spin coater
- Spray coater
- Photosensitive dry film lamination
- UV insulator
- Laser lithography
- Automatic developpers
- O2 plasma cleaning
COATING
- Pulsed laser deposition
- Metal coating with lift-off
- PVD sputtering: Physical Vapor Deposition - from ambient temperature to 700°C
- PECVD: Plasma Enhanced Chemical Vapor Deposition
- LT-PECVD: Low Temperature PECVD
- LPCVD: Low Pressure Chemical Vapor Deposition SiN et SiPoly dopé
CHEMISTRY
- Etching wet bench
- H3PO4 etching wet bench
- Solvent wet bench
- Silicon anodization wet bench
- Post-CMP scrubber
ETCHING
- IBE: Ion Beam Etching
- RIE/ICP: Reactive Ion Etching/Inductively Coupled Plasma
CHARACTERIZATION
- Spectroscopic ellipsometer
- Mechanical profilometer
- Mass spectrometer
- Digital microscope
- Inspection microscope
BONDING
- Semi-automatic wafer bonding system
- Wafer debonding
CERTeM platforms
Contact
Jérôme BILLOUÉ
CERTeM scientific director
26 rue Pierre et Marie Curie
37100 Tours
Tel: 02 47 42 41 72
Mail: certem@univ-tours.fr
CERTeM scientific director
26 rue Pierre et Marie Curie
37100 Tours
Tel: 02 47 42 41 72
Mail: certem@univ-tours.fr