CERTeM R&D platform

CERTeM R&D platform is a 400m2 class 100 clean room that contains all the equipment needed to manufacture components from small samples up to 8' wafers.
 
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PHOTOLITHOGRAPHY

Photosensitive resin coating
  • Spin coater
  • Spray coater
  • Photosensitive dry film lamination
Exposition
  • UV insulator
  • Laser lithography
Resin development and cleaning
  • Automatic developpers
  • O2 plasma cleaning

  COATING  

  • Pulsed laser deposition
  • Metal coating with lift-off
  • PVD sputtering: Physical Vapor Deposition - from ambient temperature to 700°C
  • PECVD: Plasma Enhanced Chemical Vapor Deposition
  • LT-PECVD: Low Temperature PECVD
  • LPCVD: Low Pressure Chemical Vapor Deposition SiN et SiPoly dopé

CHEMISTRY

  • Etching wet bench
  • H3PO4 etching wet bench
  • Solvent wet bench
  • Silicon anodization wet bench
  • Post-CMP scrubber

  ETCHING

  • IBE: Ion Beam Etching
  • RIE/ICP: Reactive Ion Etching/Inductively Coupled Plasma

CHARACTERIZATION

  • Spectroscopic ellipsometer
  • Mechanical profilometer
  • Mass spectrometer
  • Digital microscope
  • Inspection microscope

BONDING

  • Semi-automatic wafer bonding system
  • Wafer debonding